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Surface Analysis Equipment Product List and Ranking from 10 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated： Aggregation Period:Jan 14, 2026～Feb 10, 2026
This ranking is based on the number of page views on our site.

Surface Analysis Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Jan 14, 2026～Feb 10, 2026
This ranking is based on the number of page views on our site.

  1. 一般財団法人材料科学技術振興財団　MST Tokyo//Testing, Analysis and Measurement
  2. 東邦化研 Saitama//Electronic Components and Semiconductors
  3. アイテス Shiga//Electronic Components and Semiconductors
  4. セイコーフューチャークリエーション Chiba//Testing, Analysis and Measurement
  5. 東レリサーチセンター Tokyo//Service Industry
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Surface Analysis Equipment Product ranking

Last Updated： Aggregation Period:Jan 14, 2026～Feb 10, 2026
This ranking is based on the number of page views on our site.

  1. [Analysis Case] Evaluation of the Surface Silanol Groups 一般財団法人材料科学技術振興財団　MST
  2. Comparison of depth profiling analysis using XPS and AES. 一般財団法人材料科学技術振興財団　MST
  3. [Analysis Case] Evaluation of Nickel Plating Peel-off Surface by TOF-SIMS 一般財団法人材料科学技術振興財団　MST
  4. [Analysis Case] Quantification of Hydroxyl Groups by Chemical Modification XPS 一般財団法人材料科学技術振興財団　MST
  5. 4 [Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS 一般財団法人材料科学技術振興財団　MST

Surface Analysis Equipment Product List

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Kitano Seiki Co., Ltd. Technical Services for Vacuum and Experimental Equipment

Kitano Seiki Co., Ltd. Technical Services for Vacuum and Experimental Equipment

Feel free to contact us about any device, regardless of the manufacturer!

To ensure that our customers can use our products with peace of mind, a reliable support system is essential. At Kitano Seiki, we have established a comprehensive support system to maintain the best condition of the equipment used by our customers. We provide services that meet the usage environment and various needs of our customers at appropriate costs. 【Various Equipment and Units】 ○ Deposition Equipment (MBE, CVD, EB, Sputtering, etc.) ○ Analysis Equipment (STM, FIM, TEM, AES, etc.) ○ Various Manipulators ○ Various Sample Transport Mechanisms For more details, please contact us or download the catalog.

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[Data] List of Analysis Machines

[Data] List of Analysis Machines

White interference-equipped laser microscopes and micro-Raman spectroscopic measurement devices, among others! A wide range of analytical instruments listed.

In this document, we present a list of various analytical instruments. Starting with the "High-Resolution Gas Chromatography Mass Spectrometry (HRGC/HRMS)," we also feature a wide range of instruments such as the "Ultra-Thin Film Scratch Tester" and the "Micro Vickers Hardness Tester." Additionally, the analysis items include "materials analysis-related" topics such as molecular weight distribution and separation analysis, as well as "environmental measurement analysis-related" topics like radiation measurement and odor analysis. Please feel free to download and take a look. 【Featured Equipment (Partial)】 ■ Ultra-High-Resolution Field Emission Scanning Electron Microscope - EDS (FE-SEM/EDS) ■ Scanning Electron Microscope - Energy Dispersive X-ray Spectroscopy (SEM-EDS) ■ Energy Dispersive X-ray Fluorescence Spectrometer (EDX) ■ Ultraviolet-Visible-Near Infrared Spectrometer (UV-VIS-NIR) ■ Fourier Transform Infrared Spectrometer (FT-IR) *For more details, please refer to the PDF document or feel free to contact us.

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Treatment under non-atmospheric exposure

Treatment under non-atmospheric exposure

It is possible to evaluate the sample in its original state.

■Features ? By handling samples under atmospheric non-exposure, it is possible to minimize alteration and changes even for highly reactive samples. ? Cutting, peeling, and surface preparation under atmospheric non-exposure can reduce secondary contamination and oxidation from the atmosphere. ? Methods that can be evaluated under atmospheric non-exposure: SIMS, TOF-SIMS, AES, XPS, SEM, TEM, STEM, Raman, XRD, FIB, etc.

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[Analysis Case] Evaluation of the state of the organic thin film solar cell electrode interface and the dispersion state of the organic film.

[Analysis Case] Evaluation of the state of the organic thin film solar cell electrode interface and the dispersion state of the organic film.

It is possible to conduct a comprehensive evaluation analysis that minimizes the influence of the atmosphere.

Organic devices are devices that use materials susceptible to the effects of oxygen and water. At MST, we conduct analyses with sample transport, processing methods, and measurement environments that minimize atmospheric influences, allowing for evaluations closer to true conditions. We assessed the interface state between the organic film and the electrode using XPS analysis. We can confirm the composition and bonding state of the titania present on the surface of the organic film. Through TOF-SIMS analysis, we examined the dispersion state of P3HT (p-type organic semiconductor) and PCBM (n-type organic semiconductor) within the organic film of bulk and heterostructure organic thin-film solar cells in the depth direction.

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[Analysis Case] Evaluation of Composition Distribution in the Active Layer of Organic Thin-Film Solar Cells

[Analysis Case] Evaluation of Composition Distribution in the Active Layer of Organic Thin-Film Solar Cells

Preprocessing and depth direction analysis are possible under controlled atmosphere conditions.

In bulk heterojunction solar cells using p-type and n-type material active layers, it is necessary to properly control the mixing state of the materials within the film. After performing annealing treatment post-deposition, we conducted TOF-SIMS depth profiling analysis on samples that showed an improvement in photoelectric conversion efficiency along with an increase in fill factor without any change in open-circuit voltage. As a result, it was found that PCBM was segregated at the interface with the PEDOT:PSS layer before annealing.

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[Analysis Case] Evaluation of the State of the Electrode/Organic Layer Interface in Organic EL Devices

[Analysis Case] Evaluation of the State of the Electrode/Organic Layer Interface in Organic EL Devices

The process will be carried out from pretreatment to XPS measurement under an inert gas atmosphere.

We physically peeled off the buffer layer/Alq3 interface and conducted XPS analysis on the peeled surface (buffer layer side). By peeling in an inert gas atmosphere, we were able to expose the interface without destroying the chemical structure, and by transporting it to the XPS device while maintaining the inert gas atmosphere, we minimized post-peeling alterations (such as oxidation and moisture absorption). The main component of the buffer layer is LiF, and it was suggested that some of it may have oxidized. By controlling the atmosphere, it is possible to evaluate the oxidation states of metal elements such as Al and Li due to differences in film formation methods, treatment methods, and organic layers.

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[Analysis Case] Evaluation of the Chemical State of IGZO Film

[Analysis Case] Evaluation of the Chemical State of IGZO Film

Evaluation of bonding state and electronic state using XPS and UPS.

IGZO films are materials that are being researched and developed as TFT materials for displays. Since they are composed of multiple metal elements, it is important to understand how the composition, bonding state, and electronic state change depending on the process. We will introduce examples of evaluating the composition, bonding state, and electronic state of IGZO film surfaces using XPS and UPS.

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[Analysis Case] Quantification of Hydroxyl Groups by Chemical Modification XPS

[Analysis Case] Quantification of Hydroxyl Groups by Chemical Modification XPS

Evaluation of Hydroxyl Groups in Polymer Films

In controlling properties such as adhesion and wettability of polymer films, it is very important to quantitatively evaluate the polar functional groups (alcohol groups) present on the surface. XPS is optimal for quantitative evaluation; however, it is difficult to separate and quantify the adjacent oxidation state (C-O-C) and hydroxyl state (C-OH). In MST, after selectively reacting only the alcohol groups using a chemical modification method on polyvinyl alcohol (PVA), it is possible to quantify them using XPS. We present a case where the alcohol groups in PVA were chemically modified and evaluated using trifluoroacetic anhydride (TFAA). Measurement method: XPS, chemical modification Product fields: Electronic components, daily necessities Analysis purpose: Composition evaluation, identification, chemical bonding state evaluation For more details, please download the materials or contact us.

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[Analysis Case] Evaluation of Distribution State and Component Analysis of Fluorine-based Films

[Analysis Case] Evaluation of Distribution State and Component Analysis of Fluorine-based Films

Evaluation of distribution uniformity and identification/estimation of organic matter through surface analysis of microdomains.

The state of the water-repellent surface in water-repellent treatment differs based on whether fluorine-based compounds are distributed in an island-like manner or uniformly. Therefore, we conducted observations of the distribution of fluorine-based compounds using TOF-SIMS. As a result, it was found that they are distributed unevenly. Additionally, by performing qualitative analysis in a 1μm square area, it was determined that the fluorine-based film is Krytox. Measurement method: TOF-SIMS Product field: Electronic components and daily necessities Analysis purpose: Composition evaluation, identification, composition distribution evaluation For more details, please download the materials or contact us.

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[Analysis Case] Evaluation of Copper (Cu) Oxide Film Thickness: Differences Due to Storage Environment

[Analysis Case] Evaluation of Copper (Cu) Oxide Film Thickness: Differences Due to Storage Environment

It is possible to capture molecular information of inorganic substances in the depth direction using TOF-SIMS.

Copper (Cu), used as wiring material, forms an oxide film in the air. Here, we present a case study evaluating the differences in film thickness due to variations in storage environments. Copper (Cu) wrapped in aluminum foil and copper (Cu) stored in a plastic bag were each kept for 40 days, and the oxide film thickness was measured using TOF-SIMS. Additionally, a continuous investigation over approximately 20 days confirmed reproducibility. TOF-SIMS allows for depth profiling analysis of inorganic materials such as oxides and metals. Measurement method: TOF-SIMS Product fields: Displays, LSI, Memory, Electronic components Analysis purpose: Evaluation of chemical bonding states For more details, please download the materials or contact us.

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[Analysis Case] Evaluation of the Surface Silanol Groups

[Analysis Case] Evaluation of the Surface Silanol Groups

Quantitative evaluation of silanol groups is possible with TOF-SIMS.

The presence of silanol groups (Si-OH) on the surfaces of glass and wafers affects properties such as hydrophobicity and hydrophilicity. Therefore, it is likely to influence subsequent surface treatments, necessitating control. We will introduce a case where the quantification of silanol groups was performed using TOF-SIMS. To conduct the evaluation, calibration curves were created using several types of samples with different concentrations. In the measurement examples, the silanol groups on the surfaces of samples with different materials and conditions were compared. Measurement method: TOF-SIMS Product fields: LSI, memory, electronic components Analysis purpose: Composition evaluation and identification For more details, please download the materials or contact us.

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[Analysis Case] Evaluation of the sp2/(sp2+sp3) Ratio of DLC Films

[Analysis Case] Evaluation of the sp2/(sp2+sp3) Ratio of DLC Films

Evaluation of the sp2/(sp2+sp3) ratio using C1s waveform analysis.

Due to its characteristics such as high hardness and high wear resistance, DLC (diamond-like carbon) films are utilized in a wide range of fields. These films are materials that lie between graphite and diamond, and the separation of sp2 (graphite structure) and sp3 (diamond structure) within the film to obtain the sp2/(sp2+sp3) ratio is one of the important factors that determine the properties of the film. Here, we will introduce an example of evaluating this sp2/(sp2+sp3) ratio by analyzing the C1s spectrum using XPS.

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Comparison of depth profiling analysis using XPS and AES.

Comparison of depth profiling analysis using XPS and AES.

XPS: X-ray Photoelectron Spectroscopy AES: Auger Electron Spectroscopy

XPS and AES are surface-sensitive analytical techniques widely used for evaluating sample surfaces, but by combining them with ion etching, depth profiling analysis becomes possible. When conducting depth profiling analysis, it is important to appropriately differentiate between XPS and AES according to the area to be measured and the material of the sample in order to perform analysis that aligns with the objectives. The characteristics of depth profiling analysis using XPS and AES will be compared using the analysis of SUS passive films as an example.

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[Analysis Case] Composition Evaluation and Morphological Observation of Fuel Cell Catalyst PtRu

[Analysis Case] Composition Evaluation and Morphological Observation of Fuel Cell Catalyst PtRu

Multifaceted evaluation using XPS, SEM, and TEM.

The electrodes of fuel cells have a structure in which catalyst particles are supported on a carbon carrier. Evaluating the state of the carrier and catalyst particles is essential for understanding degradation mechanisms and considering design guidelines. XPS analysis is effective for assessing the state of catalyst poisoning (oxidation). Additionally, SEM and TEM observations are effective for evaluating catalyst agglomeration and particle growth. By combining multiple analytical methods, we propose a multifaceted evaluation.

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[Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS

[Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS

Evaluation of contamination and oxidation of Si wafers after removing the oxide film with hydrofluoric acid treatment.

Knowledge about the effects of contamination and oxidation during sample transport is important in surface analysis where the detection depth is on the nanometer order. Therefore, we examined the impact of contamination and oxidation due to differences in storage methods on Si wafers. In storage with wrapping paper and aluminum foil, there is a tendency for the peaks of organic materials caused by secondary contamination to be weaker. When samples are wrapped and stored in the matte side of aluminum foil during storage and transport, it can suppress contamination and oxidation compared to other storage methods.

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[Analysis Case] Component Analysis of Organic EL Emission Layer

[Analysis Case] Component Analysis of Organic EL Emission Layer

Possible to dismantle and preprocess while maintaining the atmosphere, up to the introduction of equipment.

It is known that organic EL materials undergo changes when exposed to air. We present results obtained from TOF-SIMS regarding the surface state of luminescent materials left in a nitrogen atmosphere and in the atmosphere. In samples produced in a nitrogen atmosphere, parent ions are primarily detected, but when left in air, fragments with oxygen attached to the parent ions are detected. For materials that are prone to degradation, it is necessary to analyze them without exposing them to the atmosphere.

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[Analysis Case] Evaluation of the Condition of Foreign Matter with Surface Oxidation Film

[Analysis Case] Evaluation of the Condition of Foreign Matter with Surface Oxidation Film

Evaluation of aluminum hydroxide Al(OH)3 and aluminum oxide Al2O3 is possible.

If you want to qualitatively evaluate metallic foreign substances, analyzing only the very surface may result in information about the oxide film present on the surface of the foreign substance, and you may not obtain information about the foreign substance itself. By performing depth analysis using TOF-SIMS, it is possible to evaluate the composition and state of the foreign substance located deeper than the oxide film. This document presents case studies evaluating the state of three locations that are believed to contain aluminum-based foreign substances.

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[Analysis Case] Depth Direction Analysis of XPS on the Micron (μm) Order

[Analysis Case] Depth Direction Analysis of XPS on the Micron (μm) Order

Depth direction analysis will be conducted to a depth of several micrometers.

XPS is a surface-sensitive technique widely used for evaluating sample surfaces, but when combined with ion etching, it allows for depth analysis. In addition to the compositional distribution in the depth direction, XPS also enables the assessment of bonding states, making it suitable for investigating the causes of discoloration on the surfaces of device components. This document presents a case study evaluated by XPS regarding the discoloration of the blades of a turbo molecular pump.

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The Kumamoto Sales Office opened on April 15, 2022 (Friday) MST!

The Kumamoto Sales Office opened on April 15, 2022 (Friday) MST!

We will base our operations at the Kumamoto Sales Office and aim to further improve our services for customers in the Kyushu region.

The first Kumamoto sales office in the Kyushu region has opened. Based in the Kumamoto sales office, we aim to further enhance our services for customers in the Kyushu area. Meetings can be held by visiting your company, and consultations on analysis can also be conducted at the sales office. We will achieve satisfactory quality and delivery times through close collaboration with our Tokyo headquarters (laboratory). Please look forward to it. Opening date: April 15, 2022 (Friday) Address: 161-1 Muro, Otsu Town, Kikuchi District, Kumamoto Prefecture, Station M 102 *Please send samples to the headquarters located in Setagaya, Tokyo. Headquarters address: 1-18-6 Kitami, Setagaya, Tokyo Phone number: 090-7017-3882 (Contact: Takeda)

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[Analysis Case] Evaluation of Oxidation State of Cu Surface by XPS

[Analysis Case] Evaluation of Oxidation State of Cu Surface by XPS

Separation of components in the Cu spectrum, quantification, and calculation of film thickness.

From the analysis of the Cu2p3/2 spectrum and Cu Auger spectrum, it is possible to evaluate the bonding state, quantitative assessment, and film thickness of the Cu surface. Major application examples include the evaluation of CMP processing and cleaning of Cu wiring, as well as the investigation of rust and discoloration of Cu electrodes. We will summarize the surface states of Cu treated with various processes and the thickness of the oxide film. (Measurements can be conducted immediately after treatment in a clean room environment.)

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[Analysis Case] Evaluation of Discoloration Causes in Ceramics

[Analysis Case] Evaluation of Discoloration Causes in Ceramics

TOF-SIMS enables imaging of the discoloration causes of inorganic materials.

Ceramics are inorganic compound materials widely used in everyday goods and electronic components. For evaluating the discoloration of ceramics caused by impurities and adherents, TOF-SIMS analysis, which allows for imaging analysis of trace components regardless of organic or inorganic substances at the focus area, is effective. This document presents a case study where the discoloration of aluminum oxide ceramics was analyzed using TOF-SIMS, demonstrating the cause of discoloration through ion images and line profiles. Measurement method: TOF-SIMS Product field: Manufacturing equipment and components Analysis purpose: Composition distribution evaluation For more details, please download the document or contact us.

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[Analysis Case] Evaluation of the Distribution of Cleaning Components on Ceramic Surfaces

[Analysis Case] Evaluation of the Distribution of Cleaning Components on Ceramic Surfaces

It is possible to visualize the distribution of cleaning components and evaluate the distribution in the depth direction.

Ceramics are inorganic compound materials widely used in everyday items and electronic components. Their surface condition significantly affects the properties and performance of materials such as everyday items and electronic components. Therefore, it is important to properly evaluate the surface condition when assessing the functionality of ceramics. This document introduces a case study evaluating the cleaning components that contribute to the wettability of ceramic surfaces made of zirconium oxide, using TOF-SIMS to assess surface distribution and depth distribution. Measurement method: TOF-SIMS Product field: Manufacturing equipment and components Analysis purpose: Qualitative and distribution evaluation For more details, please download the document or contact us.

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[Analysis Case] Composition Analysis of the Surface Film on the Positive Electrode of Secondary Batteries

[Analysis Case] Composition Analysis of the Surface Film on the Positive Electrode of Secondary Batteries

Evaluation of the distribution of organic components and active substances on the surface, qualitative analysis.

The segregation of components and the formation of films on the surface of the positive electrode of lithium-ion secondary batteries are factors that influence the electric capacity. We will introduce a case study on Li(NiCoMn)O2 (NCM), which is used as a positive electrode, where micro-region mapping was conducted using AES, and qualitative analysis of organic components (binder) and active material surface films was performed using XPS and TOF-SIMS. These methods allow for analysis with a series of treatments conducted under an Ar atmosphere, which helps to suppress the alteration of the sample.

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[Analysis Case] Wide-area Quantitative Mapping using XPS

[Analysis Case] Wide-area Quantitative Mapping using XPS

It is possible to evaluate the composition distribution in an area of up to 70×70mm.

This is an example of wide-area quantitative mapping using XPS. We evaluated organic residue on silicon wafers using the following procedure. To graph the amount (atomic concentration) rather than peak intensity, it is less affected by sample roughness and allows for data acquisition over a wide area. It is suitable for investigating organic and inorganic contamination, discoloration, surface treatments, etc., as it enables an overview assessment of the compositional distribution on the sample surface.

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Data DL available: Case studies on surface analysis 2 (XPS/AES/AFM)

Data DL available: Case studies on surface analysis 2 (XPS/AES/AFM)

We have carefully selected case studies using XPS, AES, and AFM for discoloration investigation and surface modification evaluation. Please take a look and download the materials.

In this case study collection, we will introduce examples related to "surface analysis." We feature numerous characteristics and analysis cases, including "investigation of discoloration on material surfaces using XPS," "evaluation of surface modification of PET using XPS," "analysis of hydrophobic films using XPS," and "evaluation of heating effects on plated parts." Additionally, we present analysis results, discoloration investigations, surface modification evaluations, and analyses of hydrophobic films. We encourage you to read through it. [Contents] ■ Investigation of discoloration on material surfaces using XPS ■ Evaluation of surface modification of PET using XPS ■ Analysis of hydrophobic films using XPS ■ Evaluation of heating effects on plated parts (AFM, AES) *For more details, please refer to the PDF document or feel free to contact us.

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Evaluation of the heating effects on plated parts using AFM/AES Auger electron spectroscopy.

Evaluation of the heating effects on plated parts using AFM/AES Auger electron spectroscopy.

We will conduct a multifaceted investigation of heating effects on plated components using AFM scanning probe microscopy and AES Auger electron spectroscopy.

The AFM scanning probe microscope is a device that detects various physical interactions occurring between the probe and the sample surface, allowing for the observation of surface shapes in minute areas and the measurement of electrical and mechanical properties. These physical interactions include atomic forces, frictional forces, and electrostatic forces. Additionally, measurements can be conducted in various environments, including atmospheric and vacuum conditions, enabling the observation of sample surfaces regardless of whether they are conductive or insulating. The AES Auger electron spectrometer allows for elemental analysis of the extreme surface layer of materials (approximately 5nm) and investigation of concentration gradients in the depth direction. Using these two analytical devices, we conducted a study on the heating effects on the surface of plated connector contact pins. Please take a moment to read the PDF materials. Furthermore, in addition to these analytical devices, our company also conducts various surface analyses such as XPS and GD-OES. We would be happy to assist you, so please feel free to reach out to us. Seiko Future Creation Official Website https://www.seiko-sfc.co.jp/ *Other materials are also available. If you request through the inquiry button, we will send them to you.

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Book Surface and Depth Analysis Methods [New Edition]

Book Surface and Depth Analysis Methods [New Edition]

A clear explanation of surface analysis for developers and manufacturers who are not specialists in analysis!

○Publication Date: December 10, 2007 ○Format: B5 size, paperback, 618 pages ○Price: 33,000 yen (excluding tax) → STbook member price: 31,350 yen (excluding tax) First Edition: December 2007 This book is a revised edition of "Surface and Depth Analysis Methods," published in December 2007 (ISBN 978-4-903413-30-3), with updated binding and pricing. The content is the same as the 2007 publication, so please be careful not to make a mistake when purchasing. ○Authors: Hiroyoshi Soejima, Shimadzu Scientific Research Institute, Inc. / Takeshi Teratani, Sumika Chemical Analysis Service, Ltd. / Junichiro Murayama, Sumitomo Metal Technology, Ltd. / Shinji Nagamachi, Ion Engineering Research Institute, Inc. / Keizo Ishii, Tohoku University / Kazutoshi Kakita, Nippon Steel Technoresearch, Inc. / Makoto Nishino, Shimadzu Corporation / Makishi Ishikawa, Cameca Instruments, Inc. / Takahiro Hoshi, ULVAC, Inc. / Satoshi Kawata, SII Nanotechnology, Inc. / Satoshi Yoshimi, Shimadzu Comprehensive Analysis Testing Center / and 45 others.

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  • Price：10,000 yen-100,000 yen
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Technical Information Magazine 201902-02 Development of Atmospheric Pressure RBS Analysis

Technical Information Magazine 201902-02 Development of Atmospheric Pressure RBS Analysis

The technical information magazine The TRC News provides the latest information on analytical techniques that are useful for research and development, solving production troubles, and quality control.

**Abstract** In many cases, the analysis targets in surface analysis are limited to those that can be maintained in a vacuum. On the other hand, by applying the potential of high-speed ions, it is possible to bring the analysis probe out to atmospheric pressure. At TRC, we examined Rutherford backscattering spectroscopy (RBS) at atmospheric pressure and succeeded in its realization. This paper reports on depth analysis of solid/liquid interfaces using atmospheric pressure RBS, evaluation of depth distribution of quantum dots in HeLa cells, and depth analysis of hydrogen in wet samples using atmospheric pressure RBS/HFS (hydrogen forward scattering analysis). **Table of Contents** 1. Introduction 2. Solid/Liquid Interface Analysis 3. Application to Biological Samples 4. Development of Measurement System at TRC: Atmospheric Pressure RBS/HFS Analysis 5. Conclusion

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  • Contract measurement
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Surface analysis device "Ultra High Vacuum Surface Structure Analysis Device"

Surface analysis device "Ultra High Vacuum Surface Structure Analysis Device"

A surface structure analysis device equipped with an EB evaporator suitable for the fabrication of metal thin films!

The "Ultra High Vacuum Surface Structure Analysis Device" is a surface analysis instrument capable of performing LEED diffraction patterns, Auger analysis, and temperature-programmed desorption analysis for semiconductors and model catalysts. The analyzer is equipped with a LEED/AES mass spectrometer and features an EB evaporator suitable for metal thin film fabrication. Please feel free to contact us if you have any inquiries. 【Specifications】 ■ Surface analysis system: LEED/AES ■ Evaporation source: Ultra high vacuum evaporator "AEV series" ■ Gas source: Hydrogen cracking gun "AEV series" ■ Sample heating: Direct electric heating type (TC contact type sample holder) ■ Sample manipulator: 5-axis operation with X, Y, Z, θ, and in-plane rotation axis, etc. *For more details, please contact us.

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Surface analysis of discolored and altered materials using XPS (ESCA).

Surface analysis of discolored and altered materials using XPS (ESCA).

Measures and avoidance of issues are possible! We will introduce examples verified through elemental and bonding state analysis.

Materials often undergo changes and discoloration depending on the usage environment. These changes and discoloration can lead to issues with the product's performance and design, but by understanding and clarifying the changes in molecular structure through chemical analysis, it becomes possible to address or avoid these problems. This document presents case studies that have been compared and verified through elemental and bonding state analysis via surface analysis. [Contents] ■ Analysis Samples ■ Elemental Analysis Results by XPS (ESCA) ■ Bonding State Analysis Results by XPS (ESCA) for Polycarbonate ■ Bonding State Analysis Results by XPS (ESCA) for Polyvinyl Chloride *For more details, please refer to the PDF document or feel free to contact us.

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