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Surface Analysis Equipment Product List and Ranking from 10 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

Surface Analysis Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

  1. 一般財団法人材料科学技術振興財団　MST Tokyo//Testing, Analysis and Measurement
  2. セイコーフューチャークリエーション Chiba//Testing, Analysis and Measurement
  3. 東邦化研 Saitama//Electronic Components and Semiconductors
  4. 4 ユニケミー Aichi//Testing, Analysis and Measurement
  5. 4 東レリサーチセンター Tokyo//Service Industry
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Surface Analysis Equipment Product ranking

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

  1. [Analysis Case] Evaluation of Oxidation State of Cu Surface by XPS 一般財団法人材料科学技術振興財団　MST
  2. [Analysis Case] Quantification of Hydroxyl Groups by Chemical Modification XPS 一般財団法人材料科学技術振興財団　MST
  3. [Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS 一般財団法人材料科学技術振興財団　MST
  4. 4 [Analysis Case] Evaluation of Nickel Plating Peel-off Surface by TOF-SIMS 一般財団法人材料科学技術振興財団　MST
  5. 5 [Data] List of Analysis Machines 東邦化研

Surface Analysis Equipment Product List

1～15 item / All 43 items

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Kitano Seiki Co., Ltd. Technical Services for Vacuum and Experimental Equipment

Kitano Seiki Co., Ltd. Technical Services for Vacuum and Experimental Equipment

Feel free to contact us about any device, regardless of the manufacturer!

To ensure that our customers can use our products with peace of mind, a reliable support system is essential. At Kitano Seiki, we have established a comprehensive support system to maintain the best condition of the equipment used by our customers. We provide services that meet the usage environment and various needs of our customers at appropriate costs. 【Various Equipment and Units】 ○ Deposition Equipment (MBE, CVD, EB, Sputtering, etc.) ○ Analysis Equipment (STM, FIM, TEM, AES, etc.) ○ Various Manipulators ○ Various Sample Transport Mechanisms For more details, please contact us or download the catalog.

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[Data] List of Analysis Machines

[Data] List of Analysis Machines

White interference-equipped laser microscopes and micro-Raman spectroscopic measurement devices, among others! A wide range of analytical instruments listed.

In this document, we present a list of various analytical instruments. Starting with the "High-Resolution Gas Chromatography Mass Spectrometry (HRGC/HRMS)," we also feature a wide range of instruments such as the "Ultra-Thin Film Scratch Tester" and the "Micro Vickers Hardness Tester." Additionally, the analysis items include "materials analysis-related" topics such as molecular weight distribution and separation analysis, as well as "environmental measurement analysis-related" topics like radiation measurement and odor analysis. Please feel free to download and take a look. 【Featured Equipment (Partial)】 ■ Ultra-High-Resolution Field Emission Scanning Electron Microscope - EDS (FE-SEM/EDS) ■ Scanning Electron Microscope - Energy Dispersive X-ray Spectroscopy (SEM-EDS) ■ Energy Dispersive X-ray Fluorescence Spectrometer (EDX) ■ Ultraviolet-Visible-Near Infrared Spectrometer (UV-VIS-NIR) ■ Fourier Transform Infrared Spectrometer (FT-IR) *For more details, please refer to the PDF document or feel free to contact us.

  • Analytical Equipment and Devices
  • Other environmental analysis equipment

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Treatment under non-atmospheric exposure

Treatment under non-atmospheric exposure

It is possible to evaluate the sample in its original state.

■Features ? By handling samples under atmospheric non-exposure, it is possible to minimize alteration and changes even for highly reactive samples. ? Cutting, peeling, and surface preparation under atmospheric non-exposure can reduce secondary contamination and oxidation from the atmosphere. ? Methods that can be evaluated under atmospheric non-exposure: SIMS, TOF-SIMS, AES, XPS, SEM, TEM, STEM, Raman, XRD, FIB, etc.

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[Analysis Case] Evaluation of the state of the organic thin film solar cell electrode interface and the dispersion state of the organic film.

[Analysis Case] Evaluation of the state of the organic thin film solar cell electrode interface and the dispersion state of the organic film.

It is possible to conduct a comprehensive evaluation analysis that minimizes the influence of the atmosphere.

Organic devices are devices that use materials susceptible to the effects of oxygen and water. At MST, we conduct analyses with sample transport, processing methods, and measurement environments that minimize atmospheric influences, allowing for evaluations closer to true conditions. We assessed the interface state between the organic film and the electrode using XPS analysis. We can confirm the composition and bonding state of the titania present on the surface of the organic film. Through TOF-SIMS analysis, we examined the dispersion state of P3HT (p-type organic semiconductor) and PCBM (n-type organic semiconductor) within the organic film of bulk and heterostructure organic thin-film solar cells in the depth direction.

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[Analysis Case] Evaluation of Composition Distribution in the Active Layer of Organic Thin-Film Solar Cells

[Analysis Case] Evaluation of Composition Distribution in the Active Layer of Organic Thin-Film Solar Cells

Preprocessing and depth direction analysis are possible under controlled atmosphere conditions.

In bulk heterojunction solar cells using p-type and n-type material active layers, it is necessary to properly control the mixing state of the materials within the film. After performing annealing treatment post-deposition, we conducted TOF-SIMS depth profiling analysis on samples that showed an improvement in photoelectric conversion efficiency along with an increase in fill factor without any change in open-circuit voltage. As a result, it was found that PCBM was segregated at the interface with the PEDOT:PSS layer before annealing.

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[Analysis Case] Evaluation of the State of the Electrode/Organic Layer Interface in Organic EL Devices

[Analysis Case] Evaluation of the State of the Electrode/Organic Layer Interface in Organic EL Devices

The process will be carried out from pretreatment to XPS measurement under an inert gas atmosphere.

We physically peeled off the buffer layer/Alq3 interface and conducted XPS analysis on the peeled surface (buffer layer side). By peeling in an inert gas atmosphere, we were able to expose the interface without destroying the chemical structure, and by transporting it to the XPS device while maintaining the inert gas atmosphere, we minimized post-peeling alterations (such as oxidation and moisture absorption). The main component of the buffer layer is LiF, and it was suggested that some of it may have oxidized. By controlling the atmosphere, it is possible to evaluate the oxidation states of metal elements such as Al and Li due to differences in film formation methods, treatment methods, and organic layers.

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[Analysis Case] Evaluation of the Chemical State of IGZO Film

[Analysis Case] Evaluation of the Chemical State of IGZO Film

Evaluation of bonding state and electronic state using XPS and UPS.

IGZO films are materials that are being researched and developed as TFT materials for displays. Since they are composed of multiple metal elements, it is important to understand how the composition, bonding state, and electronic state change depending on the process. We will introduce examples of evaluating the composition, bonding state, and electronic state of IGZO film surfaces using XPS and UPS.

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[Analysis Case] Quantification of Hydroxyl Groups by Chemical Modification XPS

[Analysis Case] Quantification of Hydroxyl Groups by Chemical Modification XPS

Evaluation of Hydroxyl Groups in Polymer Films

In controlling properties such as adhesion and wettability of polymer films, it is very important to quantitatively evaluate the polar functional groups (alcohol groups) present on the surface. XPS is optimal for quantitative evaluation; however, it is difficult to separate and quantify the adjacent oxidation state (C-O-C) and hydroxyl state (C-OH). In MST, after selectively reacting only the alcohol groups using a chemical modification method on polyvinyl alcohol (PVA), it is possible to quantify them using XPS. We present a case where the alcohol groups in PVA were chemically modified and evaluated using trifluoroacetic anhydride (TFAA). Measurement method: XPS, chemical modification Product fields: Electronic components, daily necessities Analysis purpose: Composition evaluation, identification, chemical bonding state evaluation For more details, please download the materials or contact us.

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[Analysis Case] Evaluation of Distribution State and Component Analysis of Fluorine-based Films

[Analysis Case] Evaluation of Distribution State and Component Analysis of Fluorine-based Films

Evaluation of distribution uniformity and identification/estimation of organic matter through surface analysis of microdomains.

The state of the water-repellent surface in water-repellent treatment differs based on whether fluorine-based compounds are distributed in an island-like manner or uniformly. Therefore, we conducted observations of the distribution of fluorine-based compounds using TOF-SIMS. As a result, it was found that they are distributed unevenly. Additionally, by performing qualitative analysis in a 1μm square area, it was determined that the fluorine-based film is Krytox. Measurement method: TOF-SIMS Product field: Electronic components and daily necessities Analysis purpose: Composition evaluation, identification, composition distribution evaluation For more details, please download the materials or contact us.

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[Analysis Case] Evaluation of the sp2/(sp2+sp3) Ratio of DLC Films

[Analysis Case] Evaluation of the sp2/(sp2+sp3) Ratio of DLC Films

Evaluation of the sp2/(sp2+sp3) ratio using C1s waveform analysis.

Due to its characteristics such as high hardness and high wear resistance, DLC (diamond-like carbon) films are utilized in a wide range of fields. These films are materials that lie between graphite and diamond, and the separation of sp2 (graphite structure) and sp3 (diamond structure) within the film to obtain the sp2/(sp2+sp3) ratio is one of the important factors that determine the properties of the film. Here, we will introduce an example of evaluating this sp2/(sp2+sp3) ratio by analyzing the C1s spectrum using XPS.

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Comparison of depth profiling analysis using XPS and AES.

Comparison of depth profiling analysis using XPS and AES.

XPS: X-ray Photoelectron Spectroscopy AES: Auger Electron Spectroscopy

XPS and AES are surface-sensitive analytical techniques widely used for evaluating sample surfaces, but by combining them with ion etching, depth profiling analysis becomes possible. When conducting depth profiling analysis, it is important to appropriately differentiate between XPS and AES according to the area to be measured and the material of the sample in order to perform analysis that aligns with the objectives. The characteristics of depth profiling analysis using XPS and AES will be compared using the analysis of SUS passive films as an example.

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[Analysis Case] Composition Evaluation and Morphological Observation of Fuel Cell Catalyst PtRu

[Analysis Case] Composition Evaluation and Morphological Observation of Fuel Cell Catalyst PtRu

Multifaceted evaluation using XPS, SEM, and TEM.

The electrodes of fuel cells have a structure in which catalyst particles are supported on a carbon carrier. Evaluating the state of the carrier and catalyst particles is essential for understanding degradation mechanisms and considering design guidelines. XPS analysis is effective for assessing the state of catalyst poisoning (oxidation). Additionally, SEM and TEM observations are effective for evaluating catalyst agglomeration and particle growth. By combining multiple analytical methods, we propose a multifaceted evaluation.

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[Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS

[Analysis Case] Surface Contamination Assessment of Si Wafers Stored Using TOF-SIMS

Evaluation of contamination and oxidation of Si wafers after removing the oxide film with hydrofluoric acid treatment.

Knowledge about the effects of contamination and oxidation during sample transport is important in surface analysis where the detection depth is on the nanometer order. Therefore, we examined the impact of contamination and oxidation due to differences in storage methods on Si wafers. In storage with wrapping paper and aluminum foil, there is a tendency for the peaks of organic materials caused by secondary contamination to be weaker. When samples are wrapped and stored in the matte side of aluminum foil during storage and transport, it can suppress contamination and oxidation compared to other storage methods.

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[Analysis Case] Evaluation of the Condition of Foreign Matter with Surface Oxidation Film

[Analysis Case] Evaluation of the Condition of Foreign Matter with Surface Oxidation Film

Evaluation of aluminum hydroxide Al(OH)3 and aluminum oxide Al2O3 is possible.

If you want to qualitatively evaluate metallic foreign substances, analyzing only the very surface may result in information about the oxide film present on the surface of the foreign substance, and you may not obtain information about the foreign substance itself. By performing depth analysis using TOF-SIMS, it is possible to evaluate the composition and state of the foreign substance located deeper than the oxide film. This document presents case studies evaluating the state of three locations that are believed to contain aluminum-based foreign substances.

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[Analysis Case] Depth Direction Analysis of XPS on the Micron (μm) Order

[Analysis Case] Depth Direction Analysis of XPS on the Micron (μm) Order

Depth direction analysis will be conducted to a depth of several micrometers.

XPS is a surface-sensitive technique widely used for evaluating sample surfaces, but when combined with ion etching, it allows for depth analysis. In addition to the compositional distribution in the depth direction, XPS also enables the assessment of bonding states, making it suitable for investigating the causes of discoloration on the surfaces of device components. This document presents a case study evaluated by XPS regarding the discoloration of the blades of a turbo molecular pump.

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